Fundamental physical and economic limitations prevent resolution enhancement with optical lithography, the traditional patterning methodology of choice. Alternative patterning materials and methodologies must be sought that enable further improvements in resolution. Block copolymers (BCPs) can self-assemble on significantly smaller length-scales than currently viable with optical lithography (ca. sub-20 nm). A necessary prerequisite for their lithographic application is a perpendicular orientation of BCP features relative to the substrate. Perpendicular lamella arise in the presence of �neutral� interfaces. Methodology that relies on BCP thin film thickness quantization has been developed to elucidate the optimal material composition for each interface via a combination of optical and atomic force microscopy. In the presence of one intentionally preferential interface, the topographic features formed are dependent only upon the wetting behavior of the opposite interface. Quantization experiments were independently performed for each interface and definitely indicated neutral materials. Perpendicular lamella with a sub-20 nm characteristic periodicity were produced rapidly by thermal annealing.

Polymers for imaging application: Neutral interface design

247th National Meeting (2014)

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