The UV/chlorine process is being considered a cost�saving alternative to the UV/H2O2 process for emerging micro�pollutant degradation in drinking water. However, the exposure of NOM to free chlorine during the micro�pollutant degradation may lead to formation of disinfection by-products (DBPs). For the UV/H2O2 process, chlorine is often added for quenching H2O2 and residual protection, leading to DBP formation as well. This study investigated the formation of DBPs from NOM in the UV/chlorine and UV/H2O2 processes at equivalent removal of carbamazepine (CBZ) and atrazine (ATZ), which represent Cl� favored and Cl� disfavored compounds, respectively, followed by chlorination. At pH 8, doses for 90% CBZ removal and 20�min subsequent chlorination, more chloroform and dichloroacetonitrile were formed from the UV/chlorine process than the UV/H2O2 process. However, chloroform and dichloroacetonitrile formation from the two processes after 24�hour chlorination became comparable. The comparison of DBP formation at equivalent removal of CBZ and ATZ under various conditions including different pH, target degradation efficiencies, bromide concentrations, bicarbonate concentrations, nitrate concentrations is being studied and will also be presented.

Comparison of DBP formation from the UV/chlorine and UV/H<sub>2</sub>O<sub>2</sub> processes at equivalent removal of carbamazepine and atrazine

248th National Meeting (2014)

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Comparison of DBP formation from the UV/chlorine and UV/H2O2 processes at equivalent removal of carbamazepine and atrazine

Comparison of DBP formation from the UV/chlorine and UV/H₂O₂ processes at equivalent removal of carbamazepine and atrazine