Bimetallic tin-tungsten carbonyl compounds such as W(CO)3(Cp)(SnMe2Cl), W(CO)3(Cp)(SnBu2Cl), and bismuth-tungsten carbonyl compounds such as Ph3BiW(CO)5 were prepared using Schlenk line technique and subsequently purified using column chromatography and thin layer chromatography. Incorporation of bulky organic ligand around tin and bismuth will help us to understand how the bulkiness affects the formation of thin oxide films. We are undertaking a detailed study of the composition and structure of these films at each stage in the patterning process to understand how factors such as ligand chemistry, temperature, and radiation influence film formation, solubility, and pattern development. Comprehensive understanding of bimetallic carbonyl compounds will inform the design of inorganic resists for the next generation of electronic devices. The application of bimetallic tin-tungsten and bismuth-tungsten carbonyl compounds in the formation of thin oxide films will be presented.

Synthesis of bimetallic tin-tungsten and bismuth-tungsten carbonyl complexes for the precursor of thin oxide films

248th National Meeting (2014)

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