WOx thin films are of interest as charge-injection materials for optoelectronics applications.  Chemical Vapor Deposition (CVD) using partially fluorinated tungsten oxo alkoxide complexes has been used to grow tungsten oxide on ITO substrates.  The morphology of the deposited material varies from amorphous films to nanorods, depending on the deposition conditions.

Chemical vapor deposition of WO<sub>x</sub> for charge-injection applications

248th National Meeting (2014)

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Chemical vapor deposition of WOx for charge-injection applications

Chemical vapor deposition of WO_x for charge-injection applications