Metal-organic frameworks (MOFs) are a class of three-dimensional permanently porous materials consisting of metal ion nodes bridged by multitopic organic ligands. The ability to tune the pore structure, surface area, metal ion, and the organic linker has positioned these materials at the forefront of research in gas storage, catalysis, and separations. The aforementioned attributes have also increased interest in the use of MOFs as sensor coatings and low-k dielectrics in microelectronic devices. Integration into microelectronics requires materials to be obtained as patterned thin films, which is challenging for MOFs since they are generally synthesized as microcrystalline powders. Current approaches to obtain patterned MOF films are typically time-consuming multistep methods. We will present an operationally simpler one-step process that takes advantage of a photobase generator to deposit MOF films only in areas exposed to UV irradiation. The use of a shadow mask thus enables the direct deposition of patterned MOF films. In addition, it will be shown how this method can be extended to coat one substrate with MOF films having different chemical compositions.Reference: B. K. Keitz, C. J. Yu, J. R. Long, R. Ameloot, Angew. Chem. Int. Ed. 2014  , in press.

Photodeposition of metal-organic frameworks: A one-step route to patterned thin films

248th National Meeting (2014)

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