Block copolymer lithography has received significant attention as a next-generation lithographic technique due to the ability to achieve morphologies with a much smaller feature size than the limitation of the conventional optical immersion lithography. We have recently investigated the effect of polymer architectures on the morphological behaviors of Si-containing diblock copolymers. Y-shaped and linear diblock copolymers of polydimethylsiloxane (PDMS)-<i>b</i>-poly(DL-lactide) (PLA) were prepared and thin-films were fabricated with sub-10 nm features. By tailoring the segmental volume fraction, morphological transitions have been observed in comparison of bulk and thin film samples of Y-shaped and linear diblock copolymers. These results indicate adjusting polymer architecture can be a powerful tool to control morphologies and domain features in block copolymer lithography.

Manipulating morphological characters with architecturally diverse block polymers for lithographic applications

249th National Meeting (2015)

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.