Block copolymers (BCPs) can self-assemble into periodic nanostructures which make them attractive for a multitude of applications. For lithographic patterning, the ability to selectively remove one block is remarkably beneficial. This process often requires harsh conditions and usually damages the other block, diminishing the fidelity of subsequent pattern transfer steps. To solve this problem, a BCP was synthesized that contained a polymer block that undergoes rapid depolymerization when exposed to strong acids. Poly(dihydroxy-tetrahydro naphthalene) (poly(DHTN)) was synthesized under high mechanical stirring from DHTN and dibromomethane in a two-phase reaction mixture. The poly(DHTN) homopolymer was coupled to azide-terminated poly(trimethylsilyl styrene) by the copper-catalyzed azide-alkyne click reaction to form the block copolymer. Selective depolymerization of the poly(DHTN) block was demonstrated in an acid vapor chamber.

Synthesis and characterization of a block copolymer containing and self-immolative block

249th National Meeting (2015)

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