Directed self-assembly (DSA) of block copolymers (BCPs) provides a material based solution to extend the patterning capabilities of optical lithography. For good DSA performance it is essential to have monodisperse BCPs free of homopolymer and other contaminants. Although PS-b-PMMA is the most widely used block copolymer for DSA, the minimum half-pitch is limited to ~10nm because of lower interaction and interaction parameter (c) between PS and PMMA. To enable further feature scaling for the advanced nodes, new BCP materials with higher interaction parameter between two blocks (higher c) is needed.<br/>Recently, we demonstrated an additive-based approach to enable perpendicular orientation of polycarbonate containing high-χ BCPs, where hexafluoroalcohol-containing phase-selective and surface active polymers were used as additives. In this talk, the effect of additive molecular weight, architecture, and composition on the thin-film self-assembly of the polycarbonate containing BCPs will be detailed. More specifically, the use of phenol and carboxylic acid containing polymeric additives for perpendicular orientation of the high-χ BCPs will be described. Finally, etch, pattern transfer and DSA performance of these additive-based BCP formulations will be highlighted.

Directed self-assembly of polycarbonate-containing high-χ block copolymers for sub 20-nm pitch patterning

251st National Meeting (2016)

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