Reproducible and practical approaches for the surface fabrication of nanopatterns from organosilanes can be accomplished with particle lithography. Spatially selective surfaces can be designed to isolate and bind nanoparticles. Organosilanes bind to surfaces by covalent bonding to generate robust, stable films and nanostructures. Approaches with particle lithography enable high throughput to generate regularly-shaped nanopatterns with a surface density of approximately 10<sup>9 </sup>patterns/cm<sup>2</sup>. The nanopatterns offer excellent model surfaces for fundamental studies of interfacial chemistry, solvent-molecule interactions and self-organization. Using octadecyltrimethoxysilane (OTMS) and 2-[methoxy(polyethyleneoxy)propyl]trichlorosilane (PEG) as a resist, nanopatterns of organosilanes were prepared on glass surfaces using particle lithography. Monodisperse mesospheres of silica or latex were deposited on the substrate for form a surface mask. A heating step was used to temporarily anneal the beads to the surface, to sustain steps of vapor deposition and immersion. When the surface mask was removed, a periodic arrangement of nanoholes was generated, with spacing corresponding to the diameters of the mesosphere mask. The nanoholes contain circular areas of exposed substrate for attaching a second organosilane. After each step of nanofabrication, atomic force microscopy (AFM) was done to visualize the changes in surface morphology. Cursor profiles were used to evaluate the thickness, orientation and density of nanostructures. Planned directions for this research will apply particle lithography with organosilanes to develop spatially selective surfaces for patterning nanoparticles.

Surface assembly of octadecyltrimethoxysilane and 2-[methoxy(polyethyleneoxy)propyl]trichlorosilane nanostructures for the deposition of metal nanoparticles

251st National Meeting (2016)

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