A post-treatment S doping methodology using existing nanomesh graphene (NMG) as the starting materials is developed to obtain S-doped nanomesh graphene (SNMG) with well-controlled structure, based on the S-doping reaction between carbon and MgSO4. Scanning transmission electron microscopy combining with X-ray photoelectron spectroscopy (XPS) analysis reveal that S atoms have been homogeneously incorporated into the sp2 carbon frameworks via covalent bonds. The maximum concentration of S detected by XPS is 1.2 atom % (corresponding to 3.13 wt. %), which is consistent with the measurement of element analysis (3.36 wt. %), embodying the good doping uniformity of this methodology. When using as the electrode for supercapacitors, the maximum specific capacitance of the SNMG electrode was up to 308 F g-1 at a scan rate of 1 mV s-1. Moreover, the electrode exhibited a capacitance retention ratio of almost 100% even after 2000 cycles.

Preparation of S-doped nanomesh graphene based on the post-treatment methodology: A high-performance electrode for supercapacitor

251st National Meeting (2016)

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