Crystalline silicon has been the material of choice for the ever smaller, faster and cheaper transistors for over 50 years. In this talk, I will give an overview of amorphous silicon, in the form of polymers, as an enabling materials platform for modern nanoelectronic manufacturing. I will discuss silicon-containing polymers as photosensitive active patterning materials, as light-absorbing anti-reflective coatings and as permanent on-chip photo-patternable dielectric materials. These silicon-containing polymers have enabled a new chip making technology called multiple patterning that are indispensable for making some of the most popular electronic devices in the world today.

Si-containing polymers as an enabling materials platform for nanoelectronic manufacturing

251st National Meeting (2016)

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