Atmospheric plasma chemical vapor deposition is an emerging technology for depositing plasma coatings in ambient air without a vacuum chamber at low cost on large substrates for energy, display, and aerospace applications. However, the abundant oxygen and moisture in air poses a significant challenge for control the plasma reaction path and incorporating specific oxygen-sensitive components in the coating.<br/>In this study, we demonstrate a strategy using dual precursors for atmospheric plasma deposition. Two different type of organic secondary precursors were found and revealed to have different functions. 1, 5-cyclooctadiene (CYC) is an organic ring structure that allowed incorporation of carbon chain in the coating molecular network when co-deposit with other functional silane precursor including Tetraethoxysiline (TEOS), 1,2-bis(triethoxysilyl)-ethane (BTESE) and bis(trimethoxysilyl) hexane (BTMSH), etc. The deposited coating using dual precursor method showed increased carbon content and improved adhesion with polymer substrates. The other type of organic precursor toluene worked as a buffering precursor during deposition and its fragmented product did not retain in the deposited coating. When toluene worked as a second precursor and co-deposit with a benzene structure included 1, 4-Bis(triethoxysilyl)benzene (BTESB) silane precursor, it can protect the benzene structure in BTESB from fragmentation of oxidative atmospheric plasma environment. The deposited bottom layer from dual precursors showed better UV-absorbing properties and adhesion than single BTESB precursor on plastic substrate because more benzene group was kept in the coating molecular structure.

Dual precursor atmospheric plasma deposition of organosilicate transparent functional coating on plastics

253rd National Meeting (2017)

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