This talk will describe the use of a combination of colloidal lithography, reactive ion etching, capillary force lithography, and wet etching techniques to create unique arrays of features at the nanoscale. Architectures can be created from soft materials as well as metals and employed in plasmonic or surface enhanced Raman spectroscopy. An important feature of this methodology is that it relies on multiple, simple serial steps to create libraries of patterns. By varying the details of these steps, one can create a library of complex shapes and features that would be difficult to create by other methods. Indeed, the types of features that can be formed grow exponentially with the number of steps involved. The alternative is to employ electron beam lithography, which is slower and only capable of patterning a small area. By contrast, this new stepwise approach can create patterns quickly, cheaply, and easily over areas on the order of square centimeters.

Patterning arrays of geometrically complex nanostructures on planar surfaces

253rd National Meeting (2017)

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