The translation of results obtained with well-defined single crystals under UHV conditions to industrial application is a longstanding challenge. Not only UHV is far from industrial conditions (pressure gap) but also heterogeneous materials are very different from single crystals (material gap). For instance to monitor in-situ/operando the lateral distribution of the chemical state of surfaces and interfaces during catalytic or electrochemical reactions at sub-micron level at environmental conditions as close as possible to the operational conditions of devices/processes is of crucial importance. But the possibility to investigate chemical processes with X-ray photoelectron spectroscopy by combining both aspects is still a challenge for modern experimental setups.<br/>The Escamicroscopy team of Elettra which operates a Scanning Photoemission Microscope (SPEM) has recently developed novel concepts for a new generation scanning photoelectron microscopes working under more realistic pressure conditions. The first setup, called Dynamic High Pressure (DHP), generates high pressure pulsed gas packets directed to the sample; under the influence of gas pulses samples experience a several tens mbar pressure in a burst instant. The DHP has been already used for the characterization of electrochemical devices and catalytic materials and is now a standard option of the SPEM [1]. The most recent development is an effusive cell for near-ambient pressure SPEM where the highest static pressure achievable is around 1 mbar. Samples are encapsulated in a vacuum sealed cell and located behind a 400 µm diameter size pinhole through which the focused X-ray beam illuminates surfaces and photoelectrons reach the high vacuum path towards the electron analyzer [2].

Bridging the material and pressure gaps in synchrotron based photoelectron in-situ/operando studies

253rd National Meeting (2017)

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