Cluster-based inorganic nanopatterning is a new field of research and a new technology. Few studies have been conducted to understand the elementary chemical steps of the process by which metal oxo-hydroxo clusters undergo solubility transformations upon low-energy electron exposure, a proxy for EUV radiation. Herein, we describe initial findings from variable-energy electron exposures of <i>n</i>-butylSnOOH cluster films. We report how electron energy and radiation dose induce differential solubility between exposed and unexposed regions of the films.

Characterization of <i>n</i>-butylSnOOH for nanopatterning: Radiation behavior

253rd National Meeting (2017)

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Characterization of n-butylSnOOH for nanopatterning: Radiation behavior