A general method for plasma deposition of nanostructured transition metal oxides is presented. The technique uses a flow-through, micro-hollow cathode plasma discharge (supersonic microplasma jet) and volatile organometallic precursors to deliver a highly directed flux of growth species to a substrate (Fig. 1). This fabrication approach provides a general and tunable method to deposit a variety of functional and hierarchical materials (e.g., NiO, a-Fe<sub>2</sub>O<sub>3</sub>, CoO, and CuO) on virtually any substrate (conductors, insulators, polymers, fibers, and lithographic patterns) and may offer an alternative to traditional, multi-step chemical synthesis. The effects of deposition parameters, plasma operating conditions, and substrate type on film morphology, nanostructure, and surface coverage will be highlighted. Application examples to be discussed include NiO on carbon for psuedocapacitors and CuO for Li-ion batteries.

Microplasma-based deposition of functional nanomaterials for energy storage applications

253rd National Meeting (2017)

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.