Patterned oxide structures from solution with nanometer-size features allow for the next generation for fabrication of large-area films. The film properties and specifically the properties of patterning (line-edge roughness, resolution, etc.) have been studied, but the mechanism by which they are patternable has not been studied in depth. Detailed studies of the composition and structure of films at each stage in the patterning process, as well as the deposition and development solutions are being undertaken to understand how factors such as ligand chemistry, temperature, and radiation influence film formation, solubility, and pattern development. In collaboration with the Center for Sustainable Materials Chemistry (CSMC), one specific focus regarding the photolithography process involves understanding the precursor chemistry from which the films are made. Organo-tin complexes are studied for use in photolithography due to their versatile chemistry. Oganotin halide monomers or alkyltin hydrolyzes readily in water, promoting the formation of aqueous metal-oxo clusters. Metal-oxo clusters generally contain two or more metal cations with ligands of H2O, OH-, and O-2. These ligands are easily functionalized promoting formation of new structures. Solubility of these clusters depends on the charge and ligation. Counterions are incorporated to isolate or crystallize clusters. Here we present both solution speciation of tin from monomers to nanoparticles. We are also tailoring solubility of clusters based on ligation and charge. X-ray scattering, 119Sn, 13C , 1H NMR, and single-crystal diffraction were utilized to obtain more information about the structure and chemistry of solution phase species. Future directions include synthesis of new hetero-tin clusters with catalytic properties.

Tin and alkyltin speciation on aqueous and nonaqueous solutions

253rd National Meeting (2017)

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