IBM’s probe storage approach, internally known as the ‘Millipede’ project, featured massively parallel operation of large arrays of more than 1000 AFM-style cantilevers fabricated by silicon surface-micromachining techniques to perform simultaneous storage operations with high data rate. The information was stored at record densities of up to 4 Tbit/in2 using heated tips to form indents in a polymer layer. The technology has now evolved to a nanolithography platform combining the high data rates and resolution from the storage device with a precise actuation of the levers to form nanometer accurate patterns in a thermally sensitive polymer resist. This nanolithography method called thermal scanning probe lithography (t-SPL) has demonstrated several unique lithographic features exploiting the excellent imaging capabilities of scanning probe methods. In closed loop lithography, the tool controls the writing parameters on the fly achieving nanometer accurate shaping of 3D topography patterns. Furthermore, sub 10nm resolution in resist and sub 5nm precise markerless overlay patterning have been demonstrated. These capabilities are currently used to fabricate unique devices ranging from accurate 3D light-confining structures in optical microcavities to ultra-small electronic devices in various substrates such as silicon, MoS2 and InAs nanowires.<br/>

Heatable scanning probes, from data storage to nanolithography

253rd National Meeting (2017)

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