Fast and selective polyoxometalate (POM) water oxidation catalysts (WOC) have been previously shown to interact with metal oxide surfaces with cationic surface properties. The system with TiO2 nanoporous films and Ru4Si2 has elucidated evidence of a strongly bound catalyst that retains water oxidation properties under UV-illumination. In this work, we have enhanced the stability of Ru4Si2 under turnover conditions using atomic layer deposition (ALD) while increasing the photocurrent density of the system with visible light absorbing hematite thin films. Characterization techniques including FTIR, XPS, EDX and voltammetric studies indicate that Ru4Si2 remains intact on the hematite surface with 4 nm of ALD protection.

ALD-protected polyoxometalate water oxidation catalysts immobilized on light-absorbing metal oxide thin films for enhanced durability and photocurrent density

253rd National Meeting (2017)

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