Block polymer (BP) thin films potentially can be used to template large arrays of nanopatterns for advanced nanotechnologies. However, the practical utilization of directed BP self-assembly typically requires guide patterns of relatively small size scales. One area of recent progress in our research group is the use of solvent vapor annealing and shear to manipulate nanoscale morphologies and achieve well-oriented nanostructures in a spatially-resolved manner (see Figure). More specifically, we are exploring the macroscopic alignment of BP nanostructures on a template-free substrate through raster solvent vapor annealing combined with soft shear (RSVA-SS). Our spatial control over nanoscale structures allows one to uniquely ‘write’ macroscopic patterns with microscopically aligned BP nano-features. This method significantly improves on previous approaches by eliminating the correlation between the BP alignment and shearing-pad shape, allowing continuous fabrication of highly ordered BP patterns in a two-dimensional manner. We demonstrate that complex patterns such as dashes, crossed lines, and curves can be imparted easily to thin films on featureless and untreated substrates. Furthermore, the ability to expand or shrink the “writing” size of the oriented regions from millimeters to centimeters provides a unique handle for manipulating pattern formation in an on-demand fashion.

Manipulating ordering and alignment in nanostructured thin films using simultaneous solvent annealing and shear

254th National Meeting (2017)

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