Atomic layer deposition (ALD) is a thin-film deposition technique with applications in microelectronics and catalysis. More recently, its accessibility in academic labs is leading to rapid growth in the development of novel materials and methods with spatial precision of a single atom. I will present computational and experimental work involving the growth of inorganic clusters and nanoparticles (nps) on various substrates. In particular, I will discuss growth of MnOx and ZnO nps on functionalized Au surfaces, and that of ZnO nps on the basal plane of graphene. Compared to thin-film growth, a controlled nanoparticle growth mode is turned-on by tuning surface properties of substrates. The nanostructures are characterized by spectroscopy and microscopy techniques, while computational modeling provides mechanistic details and ways to optimize growth.

Nanomaterial synthesis using atomic layer deposition

254th National Meeting (2017)

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