Gold is widely used for lab-on-a-chip electroanalytical applications and is usually patterned using photolithography followed by thermal deposition. The goal of this project is to develop a new method to pattern microscale metallic gold electrodes in a single step. Our method combines two well-known techniques, photochemical reduction and electrochemical deposition, to compensate for the drawbacks of each.  Photochemically reduced metal is easily photopatterned, but the resulting metal is often higher in resistance and structurally more fragmented than electroplated metal.  Electroplated metal can be highly conductive, but is difficult to pattern.  The new method: Microscopic Photochemical LAser Traced Electrodeposition (μPLATE) is investigated whereby a focused laser is used to locally photochemically reduce Au(III) to Au(I) and the Au(I) is subsequently electroplated to Au(0) in the vicinity of the exposure.<br/>

Combining the photoreduction of Au(III) and the electrodeposition of Au(I) in a new method to create microscopic gold patterns

254th National Meeting (2017)

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