Photoassisted chemical vapor deposition (CVD) provides a method of initiating precursor decomposition without heating thermally sensitive substrates. We have used Ru precursors, including (η3-allyl)Ru(CO)3X and CpRu(CO)2X (X = Cl, Br, I), for deposition of Ru on functionalized self-assembled monolayers via photochemical CVD, as a model for metallizing thermally-sensitive substrates. Identification of the primary photoprocess, quantum yield determination for ligand loss, and deposition of Ru onto the functionalized SAMs will be discussed.

Design and synthesis of Ru precursors for photoassisted chemical vapor deposition

255th National Meeting (2018)

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