The semiconductor industry uses the term directed self-assembly, or DSA, to describe the approach of using self-assembly of block copolymers to generate nanopatterns on semiconductor surfaces as a cost-effective approach for nanolithography on silicon. The polymer features are typically then used as masks or templates, through which 3-dimensional features are etched into the underlying semiconductor. In this talk, we will describe the conversion of block copolymer nanopatterns into plasmonic stamps, optically transparent and plasmonically active flexible stamps that can be used to drive <i>chemical </i>reactions on a silicon surface. The block copolymers themselves are converted into gold nanopatterns, incorporated into the flexible stamp, and coated with a molecular 'ink'. Upon illumination of the stamp with low intensity green light (corresponding to the absorption maximum of the gold plasmons), a dramatic increase of the local electric field of the localized surface plasmon resonance of the gold embedded within the stamp generates electron-hole pairs in the nearby silicon, driving surface reactivity. In this case, the chemistry is hydrosilylation between an alkene/alkyne and surface silicon-hydride bonds, leading to nanopatterned attachment of organic molecules on the silicon.

Polymers, plasmons, and patterns

255th National Meeting (2018)

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