Ambient-pressure X-ray photoelectron spectroscopy was used to study the O<sub>2</sub>+CO+NO reaction system on Pd(100). The surface was exposed up to ~1 Torr of gas, at temperatures ranging from 25 °C to ~350 °C. CO and NO compete for the bridge sites, and the coverages depend mainly on the relative partial pressures, as expected from their similar heats of adsorption. Presence of NO prevents the poisoning of the metallic Pd surface by O adatoms, thus hindering the surface oxide and bulk PdO formation. The observed hindrance is in good agreement with the earlier first-principle Monte-Carlo simulations in the literature.

NO+CO oxidation on Pd(100) studied by ambient-pressure XPS

255th National Meeting (2018)

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