The size and composition of heterogeneous catalysts play important roles in achieving highly active, selective and stable catalytic systems. Atomic layer deposition (ALD) is a promising synthetic method for tailoring the size and composition of metal and metal oxide catalysts. Benefiting from self-limiting surface reactions, ALD enables conformal coatings of thin films and highly dispersed nanoparticles on high-surface-area supports. The size and composition of metal and metal oxides can be controlled precisely by tuning the ratio and sequence of ALD cycles of each substance.<br/><br/>In this talk we highlight the ways ALD has been utilized to design catalysts with improved activity, selectivity, and stability under a variety of conditions (e.g., high temperature, gas and liquid phase, and corrosive environments). Due to its flexibility and control of structure and composition, ALD can create a myriad of catalytic structures with applicability for a wide range of chemical reactions.

Enhancing the stability/performance of catalysts via atomic layer deposition

255th National Meeting (2018)

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