Block copolymer (BCP) self-assembly leads to morphologies on the nanometer-scale, which has numerous technological applications. In this work, we systematically investigate the self-assembly of poly(vinylmethylsiloxane)-b-poly(methyl methacrylate) via raster solvent vapor annealing (RSVA). The high Flory-Huggins interaction parameter of the block copolymer and etchability of poly(methyl methacrylate) make this BCP a noble choice for nano-phase separation exploration. In our study, solvent vapor is transported to the polymer film via the RSVA process, a potentially scalable process that enables continuous annealing of polymer films. Like batch solvent vapor annealing processes, the choice of solvents for RSVA is of key importance and morphology may be a function of solvent composition. Herein, our carefully-selected dual solvents, each selective for one block, swell both phases, which decreases the interaction parameter and accelerates the self-assembly process. The resultant morphologies are characterized by atomic force microscopy and interpreted in the context of solvent partitioning between the two phases of the block copolymer.

Systematic study on effect of raster solvent vapor annealing using dual solvents on morphology of block copolymers under thin film confinement

255th National Meeting (2018)

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