Chemical vapor deposition (CVD) is a potentially attractive technique for the metallization of organic thin films. However, thermal CVD processes often require high temperatures which are incompatible with organic substrates. Photochemistry provides an alternative means of initiating precursor decomposition without heating the substrate. Readily available Ru precursors, such as (η<sup>3</sup>-allyl)Ru(CO)<sub>3</sub>X (X = Cl, Br, I), have been used to deposit Ru on functionalized self-assembled monolayers by means of photochemical CVD as a model system for deposition of metal on a thermally sensitive substrate. Identification of carbonyl loss as the primary photoprocess and determination of the quantum yields for ligand loss will be discussed in the context of precursor design for photochemical deposition techniques.

Photochemical reactions of Ru precursors for photoassisted chemical vapor deposition

255th National Meeting (2018)

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