Ultra-thin films of Cadmium Telluride (CdTe) were electrodeposited onto Au substrates from an acidic aqueous solution of CdSO<sub>4</sub>, and TeO<sub>2</sub> using a flow cell at room temperature. Different methods of deposition were used to form the high quality films, including co-deposition, electrochemical atomic layer deposition (E-ALD) and rectangular potential pulse electrodeposition. With focus on pulse deposition, varying potential rapidly between a cathodic and anodic value helped the formation of stoichiometric compound in atomic scale. Parametric variables for controlling the Cd/Te ratio and morphology were established. XRD results of the film deposited from our optimized method show a much sharper peak of CdTe (111) and it is worth noting usually CdTe films electrodeposited at room temperature were amorphous. CdTe films were also formed on odd shaped nanostructured Au substrates using potential pulse electrodepositon. Applying potential pulse on the nanostructured electrode showed a promising result which provides possibility for the future combination with more nanostructured materials.

Development of potential pulse deposition (PPD) of CdTe and its application on Au nanorods

256th National Meeting (2018)

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