Only a few articles have mentioned photoreactive materials relying on base-catalyzed transformations although a large number of investigations concerning analogous systems using acid-catalyzed reactions such as chemically amplified photoresists and cationic UV curing materials have been reported. This is probably due to relatively low quantum yields for photobase generation and weaker basicity of photogenerated bases, leading to low photosensitivity of the photoreactive materials doped with photobase generators. To solve this problem, we have designed novel photobase generators based on a photocyclization reaction. Photocyclization reaction of the photobase generator leads to the generation of a corresponding organic strong base. Anionic UV curing with high sensitivity was achieved by exposing the coatings comprising the photobase generator, epoxy resin jER828, and thiol monomer PE1 to 254 nm-light.

Anionic UV curing systems using photochemical generation of organic strong bases

256th National Meeting (2018)

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