The self-assembly of block copolymers is of great importance because it can be utilized to make highly ordered features, such as lamellae, cylinders, and gyroids, which are useful for applications in fields, e.g. lithography, separation, and catalysis. We managed to synthesize Si-containing block copolymers with a high χ value for different applications. By using a very high χ block copolymer, we successfully achieved a lamellar morphology with a very small periodicity (≤ 10 nm). These Si-containing block copolymers have been perpendicularly oriented and aligned to produce line and space patterns for applications in lithographic patterning. The gyroid morphology of the block copolymer attracts increasing attention because it offers a pathway to membranes, catalysts, solar cells, etc. We are also preparing Si-containing block copolymers with the gyroid morphology. The Si-containing block forms the matrix while the non-silicon containing block can be etched away to create the interconnected nanoporous channels. The Si-containing group can be further oxidized to silicon oxide to make the channel surface functional, and atomic layer deposition can be used to modify the surface energy and the diameter of the pores.

Self-assembly of Si-containing block copolymer

256th National Meeting (2018)

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