As identified in the International Technology Roadmap for Semiconductors (ITRS), CMOS-based scaling in silicon technology will reach to fundamental limitations with the demand for continuous miniaturization of device dimensions and create the need for new fabrication approaches that can produce defect free nanostructures. Although it is now possible to produce an amazing array of nanoscale materials and morphologies, assembling these into ordered arrays and integration with other materials remains a key challenge. Emerging application opportunities also drive the need for functional diversification, which requires enhanced functional density and the heterogeneous integration of functional materials with tailored structures on a CMOS platform. Although recent advancements in nanomaterial synthesis have shown some potential to replace existing CMOS technology, there are several challenges, namely the lack of technology to realize nanostructures at the wafer level and their unreliable performance as electronic devices compared to silicon-based devices, still need to be solved before these unconventional nanomaterials can be replaced or combined with existing state-of-the-art CMOS technology. Therefore, it is more realistic integrating new application specific materials and structures on a CMOS platform and take advantage of both technologies. However, this added complexity challenges the extensibility of conventional fabrication and patterning methods. Consequently, there remains a need for simple fabrication methods that can create two- and three-dimensional ordered structures, which are adaptable to a wide variety of materials. This research addresses specific application needs and related critical materials design, fabrication, and patterning challenges by exploring a relatively un-tapped novel class of functional materials – organic-inorganic hybrid frameworks and analogues, which possess robust and higher order materials architecture with tailored functionality as a viable ITRS solution for the trust areas of Patterning and Front-End-Process. These nanoscale building blocks and their assemblies, with feature size down to &lt;7 nm are designed to provide collective enhancement of the functional properties through component-to-component conjugated covalent and non-covalent interactions. Also, the operational simplicity, and processing and self-assembly through simple solution-based coatings will lead to dramatic improvements at the system level.

Tunable organic-inorganic frameworks for functional diversification and near atomic-scale dimensional-controlled patterning

256th National Meeting (2018)

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