The advancement of two-photon polymerization techniques continues to reduce the voxel size and resolution of additive machining (a.k.a. 3-D printing). Alternatively, reverse tomographic approaches discard the ‘rastering print head’ paradigm to polymerize the desired object from the liquid monomer solution. Both approaches have reached levels of sophistication where resolution and quality of the printed object is limited by the chemistry and physics of the polymeric resin itself. Our recent work begins with atomistic monomer models and uses combinations of classical and reactive molecular dynamics to bridge the gap between atomistic, particle-based models and existing continuum models. This first approach considers photoinitiated acrylate systems in the diffusion-limited case, employing topological templating and coarse-graining methods. Increasing the length and time scales of the simulation and the ability to characterize the resulting polymer networks will enable the rational design of resins for photoinitiated polymeric additive machining.<br/><br/>

Atomistic approach toward modelling additive machining

2019 Spring National Meeting

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