Focused electron beam induced deposition (FEBID) is a promising direct-write lithographic technique capable of producing complex 3-D nanostructures. During FEBID, volatilized organometallic precursor molecules adsorb onto a surface where local decomposition is initiated by the focused electron beam, stimulating metallic deposit formation and desorption of ligands into the gas phase.  Despite the utility of FEBID, the organometallic precursors used in practice often create high levels of organic contamination.  Studies on electron-induced reactions of metal complexes have identified CO and halides as privileged ligands that are likely to cleanly dissociate under FEBID conditions. This work focuses on the development of Ru(II) precursors incorporating this design strategy. In addition, the electron stimulated decomposition of these precursors will be discussed.

Ruthenium(II) carbonyl halide complexes as focused electron beam induced deposition precursors

2019 Spring National Meeting

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