The NIST team of Vivek Prabhu, Christopher Soles, Eric Lin, and Wen-li Wu will receive the 2019 ACS Team Innovation Award for their efforts to “develop quantitative measurement methods and data that led to improvements in the chemically amplified photoresists used in deep and extreme-ultraviolet lithography for semiconductor fabrication.” Numerous talented postdoctoral fellows, research associates and collaborators contributed to the Photoresist Project in the Electronics Materials Group. Some of the NIST team’s accomplishments include (1) strong public-private partnerships among industry, academia, and Government where the partners focus on a shared problem of importance to manufacturing, (2) interfacing challenges related to fundamental science with applied problems of industrial impact, and (3) the leveraging of beam lines or other National user facilities that are at the cutting edge of measurement science. A short summary of key accomplishments from X-ray and neutron scattering and reflectivity methods and spectroscopic characterization of photoresist fundamentals will be discussed.

<b>Award Address </b>(ACS Award for Team Innovation sponsored by the ACS Corporation Associates). Characterization of photoresist fundamentals by scattering and spectroscopic methods

2019 Spring National Meeting

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.

Award Address (ACS Award for Team Innovation sponsored by the ACS Corporation Associates). Characterization of photoresist fundamentals by scattering and spectroscopic methods