Chemical vapor deposition (CVD) is a potentially attractive technique for the metallization of organic thin films. However, traditional CVD (thermal CVD) processes usually require high temperatures which are not compatible with organic substrates. Instead of heating the organic substrate, photochemistry provides a milder way of initiating precursor decomposition. Pt precursors such as PtMe<sub>2</sub>(COD), PtCl<sub>2</sub>(COD) and PtMeCl(COD) are being studied for Pt deposition on functionalized self-assembled monolayers (SAMs) by means of photochemical CVD. Carboxylic acid-, hydroxyl- and methyl-terminated SAMs were used to explore the effects of surface functionality on deposition and the presence of Pt on the SAMs was confirmed by High Resolution Time of Flight Secondary Ion Mass Spectrometry (HR TOF SIMS). Synthesis of the precursors, determination of the quantum yields and deposition of Pt onto the functionalized SAMs will be discussed.

Photochemical decomposition of Pt precursors for photoassisted chemical vapor deposition

2019 Spring National Meeting

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