Focused electron beam induced deposition (FEBID) can create metal-containing nanostructures by using electrons to induce local decomposition of organometallic precursors. For FEBID to emerge as a broadly applicable nanofabrication technique, however, control must be exerted over not just the size and shape, but also the chemical composition of the nanostructures. The current practice is to use precursors designed for thermal processes, such as chemical vapor deposition (CVD). Unfortunately, organometallic precursors that yield pure metal deposits in CVD often create FEBID deposits with high levels of organic contamination. We are using mechanistic insights from surface science and gas phase electron-molecule interactions to design organometallic precursors specifically for FEBID. Synthesis of the candidate precursor complexes and evaluation of their electron-induced reactivity under UHV and steady state deposition conditions allows us to identify privileged ligands for use in FEBID. Examples will be taken from FEBID of Ru, Au, Pt and alloys.

<b>Award Address</b> (Francis P. Garvan–John M. Olin Medal sponsored by the Francis P. Garvan–John M. Olin Medal Endowment). Mechanism based design of organometallic precursors for FEBID

2019 Spring National Meeting

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Award Address (Francis P. Garvan–John M. Olin Medal sponsored by the Francis P. Garvan–John M. Olin Medal Endowment). Mechanism based design of organometallic precursors for FEBID