Atomic layer deposition (ALD) has emerged as an interesting tool for the atomically precise design and synthesis of catalytic materials. Herein, we discuss examples in which the atomic precision has been used to elucidate reaction mechanisms and catalyst structure−property relationships by creating materials with a controlled distribution of size, composition, and active site. ALD has been shown to be effective at controlling metal and metal oxide sites and improving catalytic activity, selectivity, and longevity. Other methods of controlled synthesis that have been studied in the past, many have been limited to a narrow set of materials and conditions. ALD, on the other hand, has the advantage of being able to apply self-limiting films or nanoparticles (depending on conditions) of nearly any material. Some advantages of the self-limiting nature of ALD include uniform surfaces, high conformity to surface features, control and accuracy of atomic level thickness, and extraordinary reproducibility. This talk will discuss the ALD synthesis technique and then concentrate on how we are using it to control catalyst stability, productivity and selectivity. Current work on the formation of “single-site” catalysts will be highlighted along with more classical heterogeneous catalysts. The future of the technique and the potential for upscaling will also be covered. The above conclusions are further supported by density functional theory (DFT) calculations.

Catalyst design with atomic layer deposition

2019 Spring National Meeting

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