A photochemically promoted step-growth polymerization of aryl bis(tetrafluoro-λ6-sulfanyl chlorides) with reactive partners bearing terminal alkynes was developed. The polymeric products of the addition reactions have been found to exhibit unusual physical properties. The remarkable sensitivity of the polymers to EUV and Ebeam irradiation has led to applications as wavelength dependent positive and negative tone nanolithographic resists. The incorporation of tetrafluoro-λ6-sulfanyl groups was recently extended when it was found that trifluoromethyl tetrafluoro-λ6-sulfanyl groups can be integrated into novel polyacrylate polymers. The synthesis and characterization of those materials will be described.

Preparation and reactions of tetrafluoro-λ6-sulfanyl containing polymers: Synthesis, photochemical, and physical properties

2019 Spring National Meeting

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