In recent years, solution-processed colloidal nanocrystals and quantum dots (QDs) have emerged as a versatile platform for building electronic and optoelectronic devices. These materials enable non-epitaxial deposition and low-temperature processing of light-emitting diodes, field effect transistors, near- and mid-infrared photodetectors, and solar cells<i>.</i> The transition from individual devices to the level of electronic circuits, sensor arrays, and electrically driven QD displays requires the development of material-adapted patterning methods, which was lagging behind. The lack of efficient methods for high-resolution and high-fidelity additive patterning of solution-processed electronic materials slows the transition from individual proof-of-concept devices to real-world applications. We introduce a new method for Direct Optical Lithography of Functional Inorganic Nanomaterials (DOLFIN), which uses inorganic nanomaterials with photochemically active surface ligands. This process combines multiple benefits of photolithography and is tailored toward efficient patterning of inorganic nanomaterials without diluting or contaminating them with organic photoresists and other byproducts. The range of materials that can be patterned using this new technique includes metals, semiconductors, oxides, as well as magnetic or rare earth compositions. Almost any inorganic nanomaterial can be converted into a photosensitive ink that can be directly patterned using DOLFIN. The ultimate lateral resolution of DOLFIN can extend down to about 30 nm and possibly below. No organic impurities are present in the patterned layers, which helps achieve good electronic and optical properties. The conductivity, carrier mobility, dielectric, and luminescence properties of optically patterned layers are on par with the properties of state-of-the-art solution-processed materials. The ability to directly pattern all-inorganic layers using a light exposure dose comparable to that of organic photoresists provides an alternate route for additive device manufacturing.<br/>

Direct Optical Lithography of Functional Inorganic Nanomaterials (DOLFIN) enabled by novel nanocrystal surface chemistry

2019 Spring National Meeting

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