We demonstrate the large-scale patterning of gold nanoparticles (AuNPs) through a scalable, and robust soft lithographic technique named chemical lift-off lithography. Specifically, activated patterned polydimethylsiloxane (PDMS) stamps are placed in conformal contact with a self-assembled monolayer of mercaptoalkanol-functionalized AuNPs. The patterned plasmonic nanostructures generated by "lifting-off" the PDMS exhibit collective optical properties that depend strongly on the design of the pattern. Patterned nanoparticles are readily transferred to other substrates <i>via</i> nanotransfer printing. Overall, the developed approach enables robust fabrication of wafer-scale functional architectures with pre-programmed collective plasmonic properties for applications in lasing, remote sensing, photonic crystals, metamaterials and chiral plasmonics.

Nanoparticle patterning via chemical lift-off lithography

2019 Fall National Meeting

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