Block copolymers for production of 50 Å lines and spaces for nanoimprint templates

Ji Yeon Kim

Xiaomin Yang

Stephen Sirard

Qingjun Zhu

Natsuko Ito

Austin Lane

Gregory Blachut

Yusuke Asano

Michael Maher

Christopher J Ellison

Carlos Baiz

Nathaniel Lynd

Carlton Willson

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