Peracetic acid combined with UV (i.e., UV/PAA) has emerged as a novel advanced oxidation process (AOP) for water disinfection and micropollutant degradation, but kinetic modeling for this AOP was lacking. In this study, a comprehensive model was developed to elucidate the reaction mechanisms and simulate the reaction kinetics of UV/PAA AOP. First, the accurate quantum yield of PAA under UV254 (Φ = 0.88±0.04 mol Einstein-1) was determined via simultaneous quenching of ●OH and CH3C(O)O● with 2,4-hexadiene. The comparison between experimental observations and model predictions over a wide range of conditions allowed an estimation of the reaction rate constant of PAA with ●OH (k●OH/PAA = 1.3±0.2×109 M-1s-1) with good accuracy. With derived Φ and k●OH/PAA, the kinetic model provided a relatively accurate estimation of radicals (i.e., ●OH, CH3C(O)O●, CH3C(O)OO●) concentrations. More importantly, the model was applied to mechanistically understand micropollutants degradation and microorganism inactivation under UV/PAA. This study significantly improves the fundamental understanding of the underlying chemistry under UV/PAA, therefore, facilitates the practical implementation of this novel AOP for microorganism inactivation and micropollutants degradation.

UV/peracetic acid advanced oxidation process: Kinetic modeling and application

ACS Spring Meeting 2021

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.