Focused electron beam induced deposition (FEBID) and focused ion beam induced deposition (FIBID) are direct write lithographic techniques used to fabricate complex three dimensional nanostructures on nonplanar substrates. In FEBID and FIBID, gas phase organometallic precursors are continuously introduced into a high vacuum chamber equipped with a focused high energy electron or ion beam. The precursor molecules are condensed on the substrate surface and decomposed under the electron irradiation or ion bombardment. The volatile fragments are pumped away, leaving the non-volatile decomposition products as a deposit on the substrate. <br/>     Synthesis of ruthenium FEBID and FIBID precursors with ligands (e.g., CO and halide) that have been demonstrated to dissociate under electron irradiation and ion bombardment will be discussed, along with their electron- and ion-induced chemistry.

Ruthenium(II) carbonyl halide complexes as focused electron and ion beam induced deposition precursors

ACS Spring Meeting 2021

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