Developing a fluoropolymer, especially fluoroacrylate based triblock copolymers, via surfactant-free emulsion polymerization is a challenging goal. This investigation reports the preparation of a triblock copolymer of sodium 4-vinylbenzene sulfonate (SS), butyl acrylate (BA), and 2,2,2-trifluoroethyl acrylate (TFEA) via PISA process using RAFT polymerization technique. Initially, poly(sodium 4-vinylbenzene sulfonate) [PSS] was prepared via RAFT polymerization in DMSO and was used as a macro-RAFT agent to prepare diblock copolymer of SS and BA. During this block copolymerization, the PSS macro-RAFT with grown poly(butyl acrylate) moiety acted as surfactant leading to PISA process. This diblock copolymer, poly(sodium 4-vinylbenzene sulfonate-block-butyl acrylate) (PSS-b-PBA), was used as a macro-RAFT to polymerize the fluoro monomer TFEA. Thus, the triblock copolymer, poly(sodium 4-vinylbenzene sulfonate)-block-poly(butyl acrylate)-block-poly(2,2,2-trifluoroethyl acrylate) [PSS-b-PBA-b-PTFEA (TBCP)] was prepared via PISA process. The chemical composition was interpreted from the 1H NMR and FTIR spectroscopic analyses. The morphology of the diblock and the triblock copolymer was studied by transmission electron microscopy (TEM) analysis. Interestingly, the TBCP film was highly transparent and showed interesting mechanical properties with a remarkably high elongation of 1500%. Moreover, the TBCP exhibited excellent hydrophobicity having a water contact angle (WCA) of ~122°. The TBCP films showed dielectric properties, which was analyzed using the AC-impedance analyzer. The prepared TBCP can be used as potential piezoelectric materials and in actuators.

Multifunctional triblock copolymer based on fluoroacrylate via polymerization-induced self-assembly (PISA): Synthesis and application as a thin film dielectric material

ACS Spring Meeting 2021

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