Efficient reduction of CHCl3 took place upon exposure to 350 nm photons of air saturated HCO2H/HCO2− buffers in contact with swollen films of sulfonated poly(ether etherketone), SPEEK and poly(vinyl alcohol), PVA. Chloride ions and CH2Cl2 were detected as products, a maximum quantum yield of Cl- generation, ø(Cl−), equal to 2.6 was determined when 0.36 M formate buffers served as H-atom donors at pH = 7.3 using SPEEK/PVA films with an average thickness of 50 mm. The photoreduction consisted of two steps; a slow initial process (induction period) followed by a linear and fast step of chloride ion generation. In closed systems the length of the induction period was reproducible and directly related to the O2 concentration. The quantum yield of chloride ion formation was found to be a function of the concentration of formate buffer, of pH and increased linearly with the initial CHCl3 volume added to the solutions. Occurrence of a dark post-irradiation formation of Cl- confirmed that the photoreductions proceeded via a chain process.

Radical chain reduction of CHCl3 initiated by HCO2H/HCO2− buffers in contact with swollen SPEEK/PVA films

ACS Fall 2021

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