An electron beam (e-beam) can be used to pattern zinc-imidazolate MOFs at unprecedented resolution in a direct-write lithographic approach, where the electron-irradiated MOF functions either as a positive- or negative-tone resist depending on the level of exposure and developing solvent used. Electron irradiation also allows the bottom-up synthesis of patterned MOF films. e-beam processing combined with vapor phase processing and modification of ZIF films, enable the creation of new materials and devices for separations, catalysis and sensing. For example, modification of the gas permeation properties of ZIF membranes using e-beam irradiation was demonstrated.

Electron beam modification and patterning of metal-organic frameworks

ACS Fall 2021

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.