While tantalum oxide has numerous applications for integrated electronics, the limited number of available precursors for these materials was surprising. Therefore, we undertook the synthesis of a series of tantalum aryloxides ([Ta(OAr)5]) from the alcoholation of tantalum ethoxide ([Ta(OEt)5]) or tantalum dimethylamide ([Ta(NMe2)5]. The alcohols explored focused on a series of sterically varied phenols, including: phenol (H-OPh), 2-methyl phenol (H-oMP), 2-iso-propyl phenol (H-oPP), 2-tert-butyl phenol (H-oBP), 2,6-di-methyl phenol (H-DMP), 2,6-di-iso-propyl phenol (H-DIP), 2,6-di- tert-butyl phenol (H-DBP), 2,4,6 tri-chloro- phenol (H-oMP). For the products isolated from the [Ta(OEt)5] reactions led to homo- and hetero-alkoxy devatives, including: [(oMP)4Ta(μ-OEt)]2, [Ta(oPP)5(THF)], [Ta(oBP)5(HoBP)], [Ta(DMP)5(py)], [Ta(DIP)4(OEt)], and [DIP)3Ta(μ-O)]2. In contrast, the products from the alcoholation of [Ta(NMe2)5] in toluene yielded alkoxy/amide species: [Ta(OPh)6][H2NMe2] (OAr = OPh, oMP, oPP, oBP. The samples were analyzed by a variety of analytical measurements using FTIR spectroscopy, NMR, and elemental analyses. With these compounds in hand, the conversion to thin films and nanoparticles were explored for use as coatings or nanoinks. The results from these studies will be reported in detail.

Synthesis and structural characterization of a series of tantalum aryloxides from ethoxide or amine precursors

ACS Spring 2022

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