We have investigated the effects of heat treatment on the microstructures of Ni7wt%V alloy electronic materials and the properties of the films deposited from the materials. The results show that the sputtering rate of the fine grains is larger than that of the large grains, resulting in the film uniformity issue. The large grain area has {220} texture while the fine grain area has random crystallographic orientations. The incomplete recrystallization process due to uneven heating causes the nonuniform target grain structure. The large grains can be removed by secondary annealing under consistent temperature.

Effects of heat treatment on the microstructures and properties of Ni-V alloy electronic materials

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