Dual-wavelength photochemistries allow significantly more functionality than single wavelength systems. One such system is dual-wavelength photoinitiation/photoinhibition chemistry based on camphorquinone & ethyl 4-(dimethylamino)benzoate / o-Cl-hexaarylbiimidazole (CQ & EDAB / o-Cl-HABI) in which visible irradiation initiates polymerization and UV irradiation inhibits polymerization. In this talk I will present the development of a high speed dual-wavelength continuous stereolithographic 3D printer using this photoinitiation/photoinhibition chemistry, discuss some of the limitations of the CQ & EDAB / o-Cl-HABI chemistry, and offer perspectives on future research and development directions.

Dual-wavelength photoinitiation/photoinhibition in stereolithographic additive manufacturing

Where thousands of chemistry professionals meet to share ideas and advance scientific and technical knowledge. Spring 2023 abstracts, posters, and presentations will launch at the end of March.

ACS Spring 2023

The official archive and repository for all ACS Meetings & Expositions abstracts and select posters or presentations.